Paragraf

Paragraf specializes in depositing graphene directly onto semiconductors, offering a contamination-free and scalable solution for applications in sensors, energy harvesting, and electronics. Founded in 2015 and headquartered in the United Kingdom, the company has developed an innovative technique for depositing two-dimensional materials like graphene onto semiconducting substrates, including silicon, silicon-carbide, sapphire, and gallium-nitride. This approach is both scalable and compatible with current electronic device manufacturing processes.

The company focuses on the manufacturing and semiconductor industries, aiming to leverage its technology in the energy harvesting, sensor, and semiconductor markets. Paragraf has also designed Hall-Effect Sensors to measure magnetic fields in challenging environments. The latest milestone for the company was a 162.00M Series D investment on April 10, 2024, led by the UK Infrastructure Bank (UKIB) and the government. This investment signifies a strong show of confidence in Paragraf's pioneering technology and its potential impact on the industry.

Collaborating with electronics manufacturers, Paragraf is at the forefront of driving the adoption of graphene's exceptional characteristics in various applications. The recent investment is expected to further propel the company's growth and allow it to continue leading the way in innovative semiconductor technology.